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Samsung Electronics And ASML Announce Expanded Collaboration On High NA EUV Lithography; Samsung Plans High NA EUV Adoption For DRAM High-Volume Manufacturing By 2028, Joins 12-Inch Photomask Initiative

Tue Sep-08 13:00:15partnership65

Samsung Electronics and ASML announced an expanded collaboration on High NA EUV lithography, with Samsung planning to adopt the technology for DRAM high-volume manufacturing by 2028.

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